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“Background Over the past decades, there has been enormous interest in fabricating periodic semiconductor nanostructures, in which the semiconductor nanodot or nanorod array has shown its great potential for future applications in photonic crystals [1], nanoscale transistors [2], field electron emitters [3], biomaterials [4], and light-emitting devices [5]. The well-known top-down techniques providing accurate size and geometric control in periodic semiconductor nanostructure patterning include laser interference lithography [6], nanoimprint lithography [7], ion beam lithography [8], and electron beam lithography [9].